レーザーテック(6920) – Lasertec releases a new Mask Inspection System, the MATRICS X9ULTRA Series

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開示日時:2022/04/26 10:00:00

損益

決算期 売上高 営業益 経常益 EPS
2018.06 2,125,247 568,546 569,793 48.38
2019.06 2,876,995 794,130 794,980 65.75
2020.06 4,257,292 1,506,267 1,507,073 119.92
2021.06 7,024,832 2,607,406 2,608,132 213.29

※金額の単位は[万円]

株価

前日終値 50日平均 200日平均 実績PER 予想PER
30,810.0 31,018.2 24,286.85 153.38 59.66

※金額の単位は[円]

キャッシュフロー

決算期 フリーCF 営業CF
2018.06 223,236 291,673
2019.06 485,036 580,022
2020.06 1,468,805 1,648,688
2021.06 684,990 1,048,873

※金額の単位は[万円]

▼テキスト箇所の抽出

PRESS RELEASE Lasertec Corporation 2-10-1 Shin-yokohama, Kohoku-ku, Yokohama (Code 6920 / Tokyo Stock Exchange Prime Market) Lasertec Releases a New Mask Inspection System, the MATRICS X9ULTRA Series Yokohama, Japan, April 26, 2022- Lasertec announced the release of the MATRICS X9ULTRA series, a mask inspection system designed to inspect the photomasks used in extreme ultraviolet (EUV) lithography while their pellicles are not attached. The MATRICS X810EX and X8ULTRA series, two of the mask inspection systems previously launched by Lasertec, are widely used in mask shops and wafer fabs worldwide and renowned for their high-performance inspection, low running costs, and reliability. The newly released X9ULTRA series builds on the performance of these predecessor models, offering improved performance in the detection of particles on pellicle-less EUV masks. As demand for semiconductor devices continues to grow, led by 5G, HPC, and high-performance servers, EUV lithography is being adopted for use in the semiconductor production process. In 2018, Lasertec released the X8 ULTRA series to address the need for the detection of small particles on EUV masks. Since then, it has been widely used among customers for pellicle-less EUV mask inspection. The newly released X9 ULTRA series uses Lasertec’s newly developed high-power 193nm laser light source and high NA objective lens to achieve higher detection performance than the predecessor models. Lasertec will continue to improve the performance of EUV mask inspection systems and contribute to the progress of the semiconductor industry. • A mask inspection system designed for pellicle-less EUV mask inspection in the technology • A high-power 193nm laser light source and high NA objective lens enabling improved particle Features nodes of 3nm and beyond detection performance – 1 – Applications • Quality assurance inspection of pellicle-less EUV photomasks at wafer fabs • Particle inspection for EUV photomasks at mask shops The MATRICS X9ULTRA series mask inspection system Contact: Ryoichiro Sato Solution Sales Department 3 Lasertec Corporation Phone: +81(0)45-478-7330 Fax: +81(0)45-478-7333 Email: sales@lasertec.co.jp – 2 –

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